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Athermal Azobenzene-Based Nanoimprint Lithography

Title data

Probst, Christian ; Meichner, Christoph ; Kreger, Klaus ; Kador, Lothar ; Neuber, Christian ; Schmidt, Hans-Werner:
Athermal Azobenzene-Based Nanoimprint Lithography.
In: Advanced Materials. Vol. 28 (6 April 2016) Issue 13 . - pp. 2624-2628.
ISSN 1521-4095
DOI: https://doi.org/10.1002/adma.201505552

Abstract in another language

A novel nanoimprint lithography technique based on the photofluidization effect of azobenzene materials is presented. The tunable process allows for imprinting under ambient conditions without crosslinking reactions, so that shrinkage of the resist is avoided. Patterning of surfaces in the regime from micrometers down to 100 nm is demonstrated.

Further data

Item Type: Article in a journal
Refereed: Yes
Keywords: athermal photofluidization; azobenzene; nanopatterning; nanoimprint lithography; soft lithography
Institutions of the University: Faculties
Faculties > Faculty of Mathematics, Physics und Computer Science
Faculties > Faculty of Mathematics, Physics und Computer Science > Department of Physics
Faculties > Faculty of Biology, Chemistry and Earth Sciences
Faculties > Faculty of Biology, Chemistry and Earth Sciences > Department of Chemistry
Faculties > Faculty of Biology, Chemistry and Earth Sciences > Department of Chemistry > Chair Macromolecular Chemistry I
Faculties > Faculty of Biology, Chemistry and Earth Sciences > Department of Chemistry > Chair Macromolecular Chemistry I > Chair Macromolecular Chemistry I - Univ.-Prof. Dr. Hans-Werner Schmidt
Research Institutions > Research Centres > Bayreuth Institute of Macromolecular Research - BIMF
Research Institutions
Research Institutions > Research Centres
Result of work at the UBT: Yes
DDC Subjects: 500 Science
500 Science > 500 Natural sciences
500 Science > 530 Physics
500 Science > 540 Chemistry
Date Deposited: 21 Feb 2017 09:23
Last Modified: 21 Feb 2017 09:23
URI: https://eref.uni-bayreuth.de/id/eprint/35688