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Subwavelength Etched Colloidal Monolayers : a Model System for Tunable Antireflective Coatings

Title data

Stelling, Christian ; Bernhardt, Christoph ; Retsch, Markus:
Subwavelength Etched Colloidal Monolayers : a Model System for Tunable Antireflective Coatings.
In: Macromolecular Chemistry and Physics. Vol. 216 (2015) Issue 16 . - pp. 1682-1688.
ISSN 10221352
DOI: https://doi.org/10.1002/macp.201500167

Project information

Project financing: Andere

Further data

Item Type: Article in a journal
Refereed: Yes
Institutions of the University: Faculties > Faculty of Biology, Chemistry and Earth Sciences > Department of Chemistry > Chair Physical Chemistry I > Lehrstuhl Physikalische Chemie I - Univ.-Prof. Dr. Markus Retsch
Result of work at the UBT: Yes
DDC Subjects: 500 Science
Date Deposited: 08 Nov 2019 08:09
Last Modified: 08 Nov 2019 08:09
URI: https://eref.uni-bayreuth.de/id/eprint/53113