Semiconductor Dendritic-Linear Block Copolymers by Nitroxide Mediated Radical Polymerization

Title data

Lang, Andreas ; Kogler, Franz René ; Sommer, Michael ; Wiesner, Ulrich ; Thelakkat, Mukundan:
Semiconductor Dendritic-Linear Block Copolymers by Nitroxide Mediated Radical Polymerization.
In: Macromolecular Rapid Communications. Vol. 30 (2009) Issue 14 . - pp. 1243-1248.
ISSN 1521-3927
DOI: https://doi.org/10.1002/marc.200900203

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Abstract in another language

The first synthesis of a semiconductor hybrid diblock copolymer comprised of p-type dendritic and n-type linear blocks by nitroxide mediated radical polymerization (NMRP) is reported. A triphenylamine (TPA) bearing second generation polyether dendron [G2]-OH has been functionalized with an alkoxyamine and, subsequently, perylene bisimide acrylate (PerAcr) was polymerized to obtain a hybrid block copolymer, [G2]-b-PPerAcr. The hybrid block copolymer structure is supported by 1H NMR and size exclusion chromatography. Furthermore, the novel materials were studied by UV-vis absorption spectrometry, photoluminescence, cyclic voltammetry, differential scanning calorimetry and thermogravimetry analysis.