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Stress evolution during the growth of ultrathin layers of iron and iron silicide on Si(111)

Title data

Sander, D. ; Enders, Axel ; Kirschner, J.:
Stress evolution during the growth of ultrathin layers of iron and iron silicide on Si(111).
In: Applied Physics Letters. Vol. 67 (1995) Issue 13 . - pp. 1833-1835.
ISSN 1077-3118
DOI: https://doi.org/10.1063/1.115418

Further data

Item Type: Article in a journal
Refereed: Yes
Institutions of the University: Faculties > Faculty of Mathematics, Physics und Computer Science > Department of Physics > Chair Experimental Physics XI - Functional Nanostructures > Chair Experimental Physics XI - Functional Nanostructures - Univ.-Prof. Dr. Axel Enders
Faculties
Faculties > Faculty of Mathematics, Physics und Computer Science
Faculties > Faculty of Mathematics, Physics und Computer Science > Department of Physics
Faculties > Faculty of Mathematics, Physics und Computer Science > Department of Physics > Chair Experimental Physics XI - Functional Nanostructures
Result of work at the UBT: No
DDC Subjects: 500 Science > 500 Natural sciences
500 Science > 530 Physics
500 Science > 540 Chemistry
Date Deposited: 06 Dec 2016 11:18
Last Modified: 06 Dec 2016 11:18
URI: https://eref.uni-bayreuth.de/id/eprint/35260