Title data
Glass, Roman ; Arnold, Marco ; Cavalcanti-Adam, Elisabetta Ada ; Blümmel, Jacques ; Haferkemper, Christian ; Dodd, Charlotte ; Spatz, Joachim P.:
Block copolymer micelle nanolithography on non-conductive substrates.
In: New Journal of Physics.
Vol. 6
(2004)
Issue 1
.
- 101.
ISSN 1367-2630
DOI: https://doi.org/10.1088/1367-2630/6/1/101
Abstract in another language
A new lithographic technique has been developed and applied to cell adhesion studies and electro-optical material development. Attachment of 6 nm Au particles, in periodic and non-periodic pattern, onto non-conductive substrates has been achieved. This was performed via a combination of diblock copolymer self-assembly and electron beam lithographic techniques. To optimize e-beam resolution on non-conductive materials, an additional carbon layer was thread-coated onto the substrates. This carbon coating and the diblock copolymer used in the self-assembly step were simultaneously removed by a final hydrogen plasma treatment to reveal Au nanodot patterns of unprecedented pattern quality. These optically transparent substrates (glass cover slips) were bio-functionalized via the Au-dot patterns to yield a platform for unique cell adhesion studies. The same Au-dot patterning technique was applied to sapphire substrates, which were subsequently employed to nucleate electro-optically active ZnO nanopost growth.
Further data
Item Type: | Article in a journal |
---|---|
Refereed: | Yes |
Institutions of the University: | Faculties > Faculty of Engineering Science > Chair Cellular Biomechanics > Chair Cellular Biomechanics - Univ.-Prof. Dr. Dr. Elisabetta Ada Cavalcanti-Adam |
Result of work at the UBT: | No |
DDC Subjects: | 600 Technology, medicine, applied sciences > 620 Engineering |
Date Deposited: | 12 Jun 2023 13:18 |
Last Modified: | 12 Jun 2023 13:18 |
URI: | https://eref.uni-bayreuth.de/id/eprint/81160 |