Tailored Star Block Copolymer Architecture for High Performance Chemically Amplified Resists

Titelangaben

Wieberger, Florian ; Neuber, Christian ; Ober, Christopher K. ; Schmidt, Hans-Werner:
Tailored Star Block Copolymer Architecture for High Performance Chemically Amplified Resists.
In: Advanced Materials. Bd. 24 (2012) Heft 44 . - S. 5939-5944.
ISSN 1521-4095
DOI: https://doi.org/10.1002/adma.201201547

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Abstract

Star block copolymers are demonstrated for their application as a high-performance resist material. This new resist material shows advanced progress in sensitivity and solubility contrast and is finally combinatorially optimized to achieve a 66 nm line/space pattern. The tailored molecular architecture of the star block copolymer is synthesized via core-first atom transfer radical polymerization (ATRP) and shows narrow polydispersity indices below 1.2.