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Pfeiffer, Frauke ; Felix, Nelson M. ; Neuber, Christian ; Ober, Christopher K. ; Schmidt, Hans-Werner:
Physical Vapor Deposition of Molecular Glass Photoresists : A New Route to Chemically Amplified Patterning.
In: Advanced Functional Materials.
Bd. 17
(2007)
Heft 14
.
- S. 2336-2342.
ISSN 1616-3028
DOI: https://doi.org/10.1002/adfm.200600717
Angaben zu Projekten
| Projektfinanzierung: |
Deutsche Forschungsgemeinschaft |
|---|
Abstract
A negative tone photoresist film, consisting of a molecular glass, a photoacid generator, and an acid labile crosslinker, was prepared by physical vapor deposition, a solvent-free process. Subsequent to deposition, the coevaporated monomers were exposed using 365 nm radiation, subjected to a post exposure bake step, and developed in aqueous base to produce sub-micron patterns. Combinatorial techniques were used to aid optimization of the photoresist by systematic variations in composition and exposure dose. Development factors such as concentration and time were also optimized.