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Physical Vapor Deposition of Molecular Glass Photoresists : A New Route to Chemically Amplified Patterning

Title data

Pfeiffer, Frauke ; Felix, Nelson M. ; Neuber, Christian ; Ober, Christopher K. ; Schmidt, Hans-Werner:
Physical Vapor Deposition of Molecular Glass Photoresists : A New Route to Chemically Amplified Patterning.
In: Advanced Functional Materials. Vol. 17 (September 2007) Issue 14 . - pp. 2336-2342.
ISSN 1616-301X
DOI: https://doi.org/10.1002/adfm.200600717

Official URL: Volltext

Project information

Project financing: Deutsche Forschungsgemeinschaft

Abstract in another language

A negative tone photoresist film, consisting of a molecular glass, a photoacid generator, and an acid labile crosslinker, was prepared by physical vapor deposition, a solvent-free process. Subsequent to deposition, the coevaporated monomers were exposed using 365 nm radiation, subjected to a post exposure bake step, and developed in aqueous base to produce sub-micron patterns. Combinatorial techniques were used to aid optimization of the photoresist by systematic variations in composition and exposure dose. Development factors such as concentration and time were also optimized.

Further data

Item Type: Article in a journal
Refereed: Yes
Institutions of the University: Faculties
Faculties > Faculty of Biology, Chemistry and Earth Sciences
Faculties > Faculty of Biology, Chemistry and Earth Sciences > Department of Chemistry
Faculties > Faculty of Biology, Chemistry and Earth Sciences > Department of Chemistry > Chair Macromolecular Chemistry I
Faculties > Faculty of Biology, Chemistry and Earth Sciences > Department of Chemistry > Chair Macromolecular Chemistry I > Chair Macromolecular Chemistry I - Univ.-Prof. Dr. Hans-Werner Schmidt
Profile Fields
Profile Fields > Advanced Fields
Profile Fields > Advanced Fields > Polymer and Colloid Science
Profile Fields > Advanced Fields > Advanced Materials
Research Institutions
Research Institutions > Research Centres
Research Institutions > Research Centres > Bayreuth Institute of Macromolecular Research - BIMF
Research Institutions > Research Centres > Bayreuth Center for Colloids and Interfaces - BZKG
Research Institutions > Collaborative Research Centers, Research Unit
Research Institutions > Collaborative Research Centers, Research Unit > SFB 481 Komplexe Makromolekül- und Hybridsysteme in inneren und äußeren Feldern
Result of work at the UBT: Yes
DDC Subjects: 500 Science > 540 Chemistry
Date Deposited: 29 Jun 2015 09:28
Last Modified: 29 Jun 2015 09:28
URI: https://eref.uni-bayreuth.de/id/eprint/1332