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Monte Carlo simulation of the MoS₂ sputtering process and the influence of the normalized momentum on residual stresses

Title data

Vierneusel, Bernd ; Tremmel, Stephan ; Wartzack, Sandro:
Monte Carlo simulation of the MoS₂ sputtering process and the influence of the normalized momentum on residual stresses.
In: Journal of Vacuum Science & Technology A. Vol. 33 (2015) Issue 6 . - No. 061501.
ISSN 1520-8559
DOI: https://doi.org/10.1116/1.4926383

Project information

Project financing: Deutsche Forschungsgemeinschaft

Abstract in another language

The film growth of sputtered MoS2 coatings is highly sensitive to the deposition conditions. Therefore, the effects of the deposition parameters on the resulting film structure have been studied excessively over recent decades. There is wide consensus in the literature that dense and hard MoS2 coatings show the best tribological behavior. Therefore, high-energy particle fluxes are typically favored due to momentum-induced film densification. Although particle flux ϕ and particle energy E are considered to be the most relevant for MoS2 film growth, the relationship between the process parameters and the resulting particle energetics has not yet been investigated. In this study, results from Monte Carlo simulations show the effect of cathode voltage and process pressure on the resulting particle energetics as a function of the target–substrate distance. Due to its relevance for the stress state, the normalized momentum according to Windischmann's intrinsic stress law has been investigated as a function of the deposition parameters. Based on the calculated results, it is assumed that the highest degree of particle induced densification and intrinsic stress formation can be expected at low process pressures, low target–substrate distances and high cathode voltages. However, the intensified densification effect of increased cathode voltages decreases with increasing distances to the target. In this study, the calculated results are compared with experimental residual stress data from literature. For this purpose, different ϕE1/2-factors have been calculated for 13 parameter combinations according to a Box–Behnken design by varying the parameters cathode voltage, process pressure and target–substrate distance on three different levels. A strong correlation between these calculated data and experimentally determined stresses has been found, which confirms the approach of the simulation procedure.

Further data

Item Type: Article in a journal
Refereed: Yes
Institutions of the University: Faculties > Faculty of Engineering Science > Chair Engineering Design and CAD
Profile Fields > Advanced Fields > Advanced Materials
Profile Fields > Emerging Fields > Energy Research and Energy Technology
Faculties > Faculty of Engineering Science
Profile Fields
Profile Fields > Advanced Fields
Profile Fields > Emerging Fields
Result of work at the UBT: No
DDC Subjects: 600 Technology, medicine, applied sciences > 620 Engineering
Date Deposited: 17 Sep 2020 12:03
Last Modified: 26 Jul 2022 11:44
URI: https://eref.uni-bayreuth.de/id/eprint/57063