Towards environmentally friendly, dry deposited, water developable molecular glass photoresists

Title data

Pfeiffer, Frauke ; Felix, Nelson M. ; Neuber, Christian ; Ober, Christopher K. ; Schmidt, Hans-Werner:
Towards environmentally friendly, dry deposited, water developable molecular glass photoresists.
In: Physical Chemistry Chemical Physics. Vol. 10 (2008) Issue 9 . - pp. 1257-1262.
ISSN 1463-9084
DOI: https://doi.org/10.1039/b715819j

Project information

Abstract in another language

Photoresists based on molecular glasses are gaining more and more importance as resist material
to replace polymer based photoresist. In addition environmental issues have to be considered in
the long-term. Therefore the paper describes novel negative photoresists containing a ternary
mixture of a glassy low molecular functional polyphenol where the film preparation is possible by
solvent-free physical vapor deposition. After UV light exposure and a thermal annealing process
to enable acid catalyzed crosslinking between the molecular glass and the crosslinker, the
photoresist was developed using only water to give well-defined patterns. In order to
experimentally study efficiently the multiple parameters such as composition, exposure dose, and
development times combinatorial PVD techniques were utilized.