Title data
Choi, S. Y. ; Kang, Myung-Jin ; Park, T. J. ; Tap, Roland ; Schoemaker, Stefan ; Willert-Porada, Monika:
Electrical and optical properties of ZnO films deposited by ECR-PECVD.
In: Physica Status Solidi A.
Vol. 203
(2006)
Issue 10
.
- R73-R75.
ISSN 1521-396X
DOI: https://doi.org/10.1002/pssa.200622256
Abstract in another language
The effect of bias voltage on characteristics of ZnO thin films deposited by the electron cyclotron resonance plasma-enhanced chemical vapor deposition (ECR-PECVD) method was investigated. The structural, optical and electrical properties of ZnO thin films were studied as a function of O2/dielthylzinc ratio and applied bias voltage. Applying –600 V bias voltage on the substrate during deposition can reduce the sheet resistance by a magnitude of 104 without deteriorating the optical transmittance. The optical band gap was increased from 3.36 to 3.54 eV with bias voltage increase. (© 2006 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)
Further data
Item Type: | Article in a journal |
---|---|
Refereed: | Yes |
Keywords: | 61.10.Nz; 73.61.Ga; 78.40.Fy; 81.15.Gh |
Institutions of the University: | Faculties > Faculty of Engineering Science Faculties > Faculty of Engineering Science > Former Professors > Chair Electrochemical Process Engineering - Univ.-Prof. Dr. Monika Willert-Porada Faculties Faculties > Faculty of Engineering Science > Former Professors |
Result of work at the UBT: | Yes |
DDC Subjects: | 500 Science > 500 Natural sciences 600 Technology, medicine, applied sciences > 620 Engineering |
Date Deposited: | 21 Jun 2017 09:56 |
Last Modified: | 30 Aug 2022 10:47 |
URI: | https://eref.uni-bayreuth.de/id/eprint/13101 |