Physical Vapor Deposition of Molecular Glass Photoresists : A New Route to Chemically Amplified Patterning

Title data

Pfeiffer, Frauke ; Felix, Nelson M. ; Neuber, Christian ; Ober, Christopher K. ; Schmidt, Hans-Werner:
Physical Vapor Deposition of Molecular Glass Photoresists : A New Route to Chemically Amplified Patterning.
In: Advanced Functional Materials. Vol. 17 (2007) Issue 14 . - pp. 2336-2342.
ISSN 1616-3028
DOI: https://doi.org/10.1002/adfm.200600717

Project information

Abstract in another language

A negative tone photoresist film, consisting of a molecular glass, a photoacid generator, and an acid labile crosslinker, was prepared by physical vapor deposition, a solvent-free process. Subsequent to deposition, the coevaporated monomers were exposed using 365 nm radiation, subjected to a post exposure bake step, and developed in aqueous base to produce sub-micron patterns. Combinatorial techniques were used to aid optimization of the photoresist by systematic variations in composition and exposure dose. Development factors such as concentration and time were also optimized.