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Forman, Drew C. ; Wieberger, Florian ; Gröschel, André H. ; Müller, Axel H. E. ; Schmidt, Hans-Werner ; Ober, Christopher K.:
Comparison of star and linear ArF resists.
In: Proceedings of SPIE.
Bd. 7639
(2010)
.
- 76390P.
ISSN 0277-786X
DOI: https://doi.org/10.1117/12.848344
Abstract
Linear and star-shaped ArF photoresists were prepd. and preliminary lithog. comparison was performed using electron-beam exposure. An oligo-initiator based on saccharose forms the core of the star shaped photoresist from which three std. ArF photoresist monomers, .alpha.-gamma butyrolactone methacrylate (GBLMA), Me adamantyl methacrylate (MAMA) and hydroxyl adamantyl methacrylate (HAMA) were polymd. Conditions were adjusted to obtain a low polydispersity, 6 kg/mol star polymer with a d.p. of approx. five mers per arm. For comparison, a linear photoresist control was prepd. using the same scheme. The star resist architecture was found to improve roughness without reducing sensitivity or resoln.