Influence of Carrier Gas Composition on the Stress of Alumina Coatings Prepared by the Aerosol Deposition Method

Title data

Schubert, Michael ; Exner, Jörg ; Moos, Ralf:
Influence of Carrier Gas Composition on the Stress of Alumina Coatings Prepared by the Aerosol Deposition Method.
2015
Event: 90. DKG Jahrestagung / Symposium Hochleistungskeramik 2015 , 15.-19.03.2015 , Bayreuth, Deutschland.
(Conference item: Conference , Other Presentation type)

Project information

Abstract in another language

The Aerosol deposition Method (ADM) is a novel ceramic coating method, which allows manufacturing dense ceramic films at room temperature directly from powders without any high temperature sintering steps and without expensive vacuum processes. Due to its deposition mechanism based on collision and densification of fine ceramic powder particles on a substrate it is also called “Room Temperature Impact Consolidation” (RTIC). For this study, Al2O3 films were prepared by ADM using different carrier gas compositions. The layers were deposited on alumina substrates and the film stress of the layer was calculated by measuring the deformation of the substrate. It was shown that the film stress can be halved by using oxygen instead of nitrogen or helium as the carrier gas. The substrates were annealed at different temperature steps to gain information about the temperature dependence of the reduction of the implemented stress. Total relaxation of the stress can already be achieved at 300 °C. The XRD pattern shows crystallite growth and reduction of microstrain while annealing.